Abstract:The gap sizes between electrodes generated by typical methods are generally much larger than the dimension of a common molecule when fabricating a single-molecule junction, which dramatically suppresses the yield of single-molecule junctions. Based on the ab initio calculations, we develop a strategy named the field-aided method to accurately fabricate an atomic-sized gap between gold nanoelectrodes. To understand the mechanism of this strategy, configuration evolutions of gold nanojunction in stretching and compressing processes are calculated. The numerical results show that, in the stretching process, the gold atoms bridged between two electrodes are likely to form atomic chains. More significantly, lattice vacant positions can be easily generated in stretching and compressing processes, which make field-aided gap generation possible. In field-aided atom migration (FAAM), the external field can exert driving force, enhance the initial energy of the system, and decrease the barrier in the migration path, which makes the atom migration feasible. Conductance and stretching and compressing forces, as measurable variables in stretching and compressing processes, present very useful signals for determining the time to perform FAAM. Following this desirable strategy, we successfully fabricate gold nanogaps with a dimension of 0.38 +/- 0.05 nm in the experiment, as our calculation simulates.

Fabricating Nanogaps Between Nanoelectrodes Using Dielectrophoresis Technique for Molecular Fluorescence Enhancement

Fabrication of Single-Nanometer Metallic Gaps Via Spontaneous Nanoscale Dewetting

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

Real Time and in Situ Control of the Gap Size of Nanoelectrodes for Molecular Devices

Fabrication of Si–Ag “wire-cap” nanostructures for metal-enhanced fluorescence

Chemical fabrication of heterometallic nanogaps for molecular transport junctions.

Fabrication of nanometer-spaced electrodes using gold nanoparticles

Molecular crystal lithography: a facile and low-cost approach to fabricate nanogap electrodes.

Sub-5 nm nanogap electrodes towards single-molecular biosensing

Nanosphere Lithography for Sub-10-Nm Nanogap Electrodes

Fabrication of Submicron-Gap Electrodes by Silicon Volume Expansion for DNA-detection

Integrating Sub-3 Nm Plasmonic Gaps into Solid-State Nanopores

Fabricating Atom-Sized Gaps by Field-Aided Atom Migration in Nanoscale Junctions

Nanogap Electrode-Enabled Versatile Electrokinetic Manipulation of Nanometric Species in Fluids

Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

High-Throughput Fabrication of Ultradense Annular Nanogap Arrays for Plasmon-Enhanced Spectroscopy

Nanogap Electrodes: Single Grain Boundary Break Junction for Suspended Nanogap Electrodes with Gapwidth Down to 1–2 nm by Focused Ion Beam Milling (Adv. Mater. 19/2015)

Fabrication of Nanogap Structures Through Spatially Shaped Femtosecond Laser Modification with the Assistance of Wet Chemical Etching.

Fabrication of A Nano-Scale Gap by Selective Chemical Deposition

Fabrication of Sub-20nm Metal Nanogaps from Nanoconnections by the Extended Proximity Effect

A 30 Nm Nanopore Electrode: Facile Fabrication and Direct Insights into the Intrinsic Feature of Single Nanoparticle Collisions.