Abstract:Transmission electron beams (TEBs) have long been used to study and manipulate materials at nanometer scales. In the late 1970's, Cherns demonstrated surface pitting in Au films upon exposure to a 1MeV TEB and observed crystal dislocations in quartz. Soon after, electron beam irradiation was used to drill nanoholes and lines in NaCl crystals, alumina sheets, CaF2 and MgO. More recent examples include the drilling of nanoholes in silicon, stainless steel, and in Si3N4 and SiO2 membranes. In this Letter we demonstrate a new and highly flexible application of TEB-based fabrication to produce intricate metal geometries and fully integrated devices, with sub-10 nm features, on silicon nitride membranes. Arbitrary metal patterns may be "carved out" with sub-nanometer accuracy by ablating evaporated (Al, Ni, Cr, Ag, Au) metal films with the ~ 0.5 nm diameter beam of a high resolution transmission electron microscope. In situ imaging of the ablation action allows for real-time feedback control. Specific examples presented here include nanorings, nanowires with tailored curvatures and multi-terminal devices with nanoislands or nanoholes between the terminals. Importantly, these nanostructures are fabricated at precise locations on a chip and seamlessly integrated into large-scale circuitry. The combination of high resolution, geometrical control and yield make this fabrication method rather unique and highly attractive for many applications including nanoelectronics and molecular translocation.

Fabrication of Sub-20nm Metal Nanogaps from Nanoconnections by the Extended Proximity Effect

Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

Fabrication of Two- and Three-Terminal Nanogap Structure by Using Electron Beam Lithography

Batch Fabrication of Gold-Gold Nanogaps by E-beam Lithography and Electrochemical Deposition.

Lithography-Independent and Large Scale Fabrication of A Metal Electrode Nanogap

Fabrication of A Nano-Scale Gap by Selective Chemical Deposition

Fabrication of nanogap metal electrode with sacrificial layer techniques

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

5 Nm Nanogap Electrodes and Arrays by Super-resolution Laser Lithography.

Fabrication of nanometer-spaced electrodes using gold nanoparticles

Fabrication of Nanogap Structures Through Spatially Shaped Femtosecond Laser Modification with the Assistance of Wet Chemical Etching.

Fabricating Nanogaps Between Nanoelectrodes Using Dielectrophoresis Technique for Molecular Fluorescence Enhancement

Atomic layer deposition assisted fabrication of large-scale metal nanogaps for surface enhanced Raman scattering

Fabrication of Metal Nanoscale Devices on Insulating Membranes by High-Resolution Atom Ablation

Controllable Formation of Nanogaps in Thin Metallic Film by Rear Side Irradiation with Ultrashort Pulsed Laser

Laser shock forming of metal nanostructures with ultrafine gaps

Atomic-layer Lithography of Sub-10-nm Plasmonic Nanogaps on Flat Metallic Surface

A Novel Pmma/Neb Bilayer Process for Sub-20 Nm Gold Nanoslits by A Selective Electron Beam Lithography and Dry Etch

Precise Fabrication of Uniform Molecular Gaps for Active Nanoscale Devices

Flat Metallic Surface Gratings with Sub-10 Nm Gaps Controlled by Atomic-Layer Deposition

Fabrication of Controllably Variable Sub-100 Nm Gaps in Silver Nanowires by Photothermal-Induced Stress.