Chemical Vapor Deposition Of Layered Two-Dimensional Mosi2n4 Materials

Yi-Lun Hong,Zhibo Liu,Lei Wang,Tianya Zhou,Wei Ma,Chuan Xu,Shun Feng,Long Chen,Mao-Lin Chen,Dong-Ming Sun,Xing-Qiu Chen,Hui-Ming Cheng,Wencai Ren
DOI: https://doi.org/10.1126/science.abb7023
IF: 56.9
2020-01-01
Science
Abstract:Identifying two-dimensional layered materials in the monolayer limit has led to discoveries of numerous new phenomena and unusual properties. We introduced elemental silicon during chemical vapor deposition growth of nonlayered molybdenum nitride to passivate its surface, which enabled the growth of centimeter-scale monolayer films of MoSi2N4. This monolayer was built up by septuple atomic layers of N-Si-N-Mo-N-Si-N, which can be viewed as a MoN2 layer sandwiched between two Si-N bilayers. This material exhibited semiconducting behavior (bandgap similar to 1.94 electron volts), high strength (similar to 66 gigapascals), and excellent ambient stability. Density functional theory calculations predict a large family of such monolayer structured two-dimensional layered materials, including semiconductors, metals, and magnetic half-metals.
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