Influence of Isothermal Annealing on Stress Relaxation of Shot Peened SiCw/Al Composite

Junjie Huang,Chuanhai Jiang,Qi Wang
2011-01-01
Abstract:The residual stress relaxation of the shot peened layer on the SiCw/Al composite during isothermal annealing was investigated. The results showed that the residual stresses relaxed in the whole deformation layer especially when the annealing temperature was higher than 200°C. The relaxation process during isothermal annealing could be described using Zener-Wert-Avrami function when the annealing temperature was larger than 200°C. Because of high intensity dislocation around reinforcements producing a large amount of stored energy, activation enthalpy of shot peened SiCw/Al was smaller than self diffusion activation enthalpy of pure aluminum. According to the full width at half maximum (FWHM) of the shot peened composite vs time in different temperatures annealing, it can be concluded the recovery and recrystallization behavior became intensely when anneal temperature was larger than 200°C. The small relaxation of residual stress in low annealing temperature was mainly due to partly recovery and recrystallization in a very low level.
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