N-type Doping of Black Phosphorus Single Crystal by Tellurium.

Ying Yu,Boran Xing,Jiadong Yao,Xinyue Niu,Yali Liu,Xiaoxiang Wu,Xiaoyuan Yen,Mengge Li,Jian Sha,Yewu Wang
DOI: https://doi.org/10.1088/1361-6528/ab8c08
IF: 3.5
2020-01-01
Nanotechnology
Abstract:Black phosphorus has many potential applications in optoelectronic devices because of its unique properties. Adjusting its performance by doping is an important issue of research. In this paper, we synthesized high-quality Te-doped crystals by the chemical vapor transport method. Tellurium doping with an atomic ratio of 0.1% was confirmed by X-ray photoelectron spectroscopy, X-ray diffraction, and energy dispersive X-ray analysis. The performance of field effect transistors devices shows that the hole mobility of Te-doped black phosphorous (BP) is significantly improved compared with that of undoped-BP. The highest hole mobility at room temperature is 719 cm2 V-1 s-1, and the electron mobility is 63 cm2 V-1 s-1. Te-doped BP field effect transistors show an obvious bipolar behavior.
What problem does this paper attempt to address?