Thermoelectric Transport of the Half-Filled Lowest Landau Level in a P -Type Ge/SiGe Heterostructure

Xiaoxue Liu,Tzu-Ming Lu,Charles Thomas Harris,Fang-Liang Lu,Chia-You Liu,Jiun-Yun Li,Chee Wee Liu,Rui-Rui Du
DOI: https://doi.org/10.1103/physrevb.101.075304
2020-01-01
Abstract:We investigate the thermoelectric transport properties of the half-filled lowest Landau level v = 1/2 in a gated two-dimensional hole system in a strained Ge/SiGe heterostructure. The electron-diffusion dominated regime is achieved below 600 mK, where the diffusion thermopower S-xx(d) at v = 1/2 shows a linear temperature dependence. In contrast, the diffusion-dominated Nernst signal S-xy(d) of v = 1/2 is found to approach zero, which is independent of the measurement configuration (sweeping magnetic field at a fixed hole density or sweeping the density by a gate at a fixed magnetic field).
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