Charge Transport in Vertical GaN Schottky Barrier Diodes: A Refined Physical Model for Conductive Dislocations

Leilei Chen,Ning Jin,Dawei Yan,Yanrong Cao,Linna Zhao,Hailian Liang,Bin Liu,En Xia Zhang,Xiaofeng Gu,Ronald D. Schrimpf,Daniel M. Fleetwood,Hai Lu
DOI: https://doi.org/10.1109/ted.2020.2965953
IF: 3.1
2020-01-01
IEEE Transactions on Electron Devices
Abstract:Charge transport mechanisms of forward and reverse leakage currents in vertical GaN Schottky barrier diodes are investigated by measuring the temperature-dependent current-voltage characteristics. The results show that the leakage current is primarily governed by dislocation-associated thermionic field emission (TFE). The primary transport path is the reduced, localized conduction band around the dislocation core rather than the continuum defect states. A refined phenomenological physical model is developed for conductive dislocations in GaN, emphasizing that: 1) surface donors, surrounding the core of dislocations, can significantly shrink the barrier region after ionization, causing severe TFE leakage; 2) the donors likely to be responsible for TFE have a typical density of cm at 300 K and activation energy of 78 meV; and 3) the barrier height at donor sites is similar to 0.65 eV at 300 K, which is reduced by similar to 0.4 eV with respect to the dislocation-free region.
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