Chemical Vapor Growth of Silicon Phosphide Nanostructures

Zhuoqun Wen,Yiping Wang,Zhizhong Chen,Jian Shi
DOI: https://doi.org/10.1557/adv.2019.437
2020-01-01
MRS Advances
Abstract:In the search for chemically stable two-dimensional (2D) materials with high in-plane mobility, proper bandgap, and compatibility with vapor-based fabrication, van der Waals semiconductor SiP has become a potential candidate as a robust variation of black phosphorous. While bulk SiP crystals were synthesized in the 1970s, the vapor-based synthesis of SiP nanostructures or thin films is still absent. We here report the first chemical vapor growth of SiP nanostructures on SiO 2 /Si substrate. SiP islands with lateral size up to 20 µm and showing well-defined Raman signals were grown on SiO 2 /Si substrate or on SiP-containing concentric rings. The presence of SiP phase is confirmed by XRD. The formation of rings and islands is explained by a multiple coffee ring growth model where a dynamic fluctuation of droplet growth front induces the topography of concentric ring surfaces. This new growth method might shed light on the controlled growth of group IV-III high-mobility 2D semiconductors.
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