Hydrogen Existence State of a Hydrogenated Amorphous Carbon Coating and Its Thermal Stability

Jihua Peng,Manzhong Yang,Jun Bi,Ruida Sheng,Liejun Li
DOI: https://doi.org/10.1016/j.diamond.2019.107535
IF: 3.806
2019-01-01
Diamond and Related Materials
Abstract:Hydrogenated amorphous carbon (a-C:H) coatings were deposited by plasma-enhanced chemical vapor deposition at a bias voltage of 740 V. The coated 316 L sample was annealed in 5 Pa argon media. The hydrogen content, chemical bond structure, and morphology of the coating and their evolution during annealing were characterised by elastic recoil detection analysis, mass spectrometry, Fourier transformation infrared spectroscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy, respectively. It was found that the hydrogenated a-C:H coating had similar to 50 at. % hydrogen. However, a large part of the hydrogen probably exists in the form of hydrogen molecules, some of which was encapsulated in some "closed" voids. Obviously, this special structure is an effective way to improve the sp3 C-C fraction in the a-C:H with high H content. The molecular hydrogen could stay in the "closed" voids stably during annealing below 490 degrees C. For these a-C:H coatings with specific structure, when annealed below 330 degrees C, the transformation of C sp(3) to sp(2) was controlled by the so-called active C-H bond reaction in the a-C:H coating. Annealed above 330 degrees C, these active C-H bonds were depleted out quickly, and carbon clusters started to grow. At annealing temperatures > 490 degrees C, the rapid transformation of C sp(3) to C sp(2) was attributed to C sp(3) bond breakage and atomic rearrangement induced by overcoming energy barrier.
What problem does this paper attempt to address?