Abstract:The study concentrates on systematic investigations on the effects of extremely high or low carbon concentration (2%-14%) and gas pressure (800 Pa-3200 Pa) on crystal structures, grain sizes, phase compositions, surface and cross-sectional morphologies, growth rates, surface roughness, mechanical and tribological performances of various polycrystalline diamond films synthesized on cemented carbide (WC-Co) substrates with hydrogen-rich/ argon-lean gas mixture adopting hot filament chemical vapor deposition (HFCVD) method. The crystal structure, grain size and phase composition of various diamond films synthesized with different carbon concentration and gas pressure were analyzed, indicating that as-deposited diamond films cover microcrystalline diamond (MCD), submicrocrystalline diamond (SMCD), nanocrystalline diamond (NCD) and ultrananocrystalline diamond (UNCD). The surface and cross-sectional morphologies of these various polycrystalline diamond films were observed, and the growth rates of various diamond films were calculated. The three-dimensional morphologies and surface roughness were obtained. With increasing the carbon concentration and decreasing the gas pressure during the synthesis, the crystal size decreases so that diamond film with high smoothness, low surface roughness can be obtained. Subsequently, the synthesis mechanisms of MCD, SMCD, NCD and UNCD films with different carbon concentration and gas pressure under hydrogen-rich gas mixture adopting HFCVD were discussed in detail. The elastic modulus and nanohardness of different diamond films were measured quantitatively, and the film-substrate adhesion were evaluated qualitatively. Moreover, the tribological performances of various diamond films synthesized with different carbon concentration and gas pressure were studied by sliding against silicon nitride (Si3N4) ceramic balls. Results indicate that obtaining the dynamic equilibrium between sufficiently renucleation rate of diamond nuclei and effectively removal rate of non-diamond carbon phase by adjusting carbon and gas pressure under the hydrogen-rich gas chemistry can contribute to the synthesis of high-quality UNCD film.

Formation of Molecular Hydrogen in Diamond-Like Carbon Films During Deposition: Molecular Dynamics Simulations

Molecular dynamics simulations of the growth of thin amorphous hydrogenated carbon films on diamond surface

Deposition of Tetrahedral Hydrogenated Amorphous Carbon Using a Novel Electron Cyclotron Wave Resonance Reactor

Growth Mechanism of Hydrogenated Amorphous Carbon Films: Molecular Dynamics Simulations

Molecular Dynamics Simulation of the Deposition Process of Hydrogenated Diamond-Like Carbon (DLC) Films

Low-Temperature Growth Of Ultra-Thin Nano-Crystalline Diamond Films By Hfcvd In A Ch4/H-2 Mixture

The Effect of Relatively Low Hydrogen Dilution on the Properties of Carbon-Rich Hydrogenated Amorphous Silicon Carbide Films

Hydrogen Existence State of a Hydrogenated Amorphous Carbon Coating and Its Thermal Stability

Formation and Transport of Atomic Hydrogen in Hot-Filament Chemical Vapor Deposition Reactors

Effect of Nonbonded Hydrogen on Structure and Properties of DLC Films

Properties of Tetrahedral Amorphous Carbon Films Deposited in a Filtered Cathodic Arc in the Presence of Hydrogen

Structure Character in Small-Carbon-cluster Deposition on Diamond Surface

Molecular Dynamics Simulation of Growth of Diamond-Like Carbon Films

Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas

Effect of Unbonded Hydrogen on Amorphous Carbon Film Deposited by PECVD with Annealing Treatment

Effects of Carbon Concentration and Gas Pressure with Hydrogen-Rich Gas Chemistry on Synthesis and Characterizations of HFCVD Diamond Films on WC-Co Substrates

Interactions of Atomic and Molecular Hydrogen with a Diamond-like Carbon Surface: H2 Formation and Desorption

Deposition of Microcrystalline Diamond Films in H2 Microwave Plasma with Graphite Powder As Hydrocarbon Precursor

Investigation On Structure And Physical Properties Of Hydrogenated Amorphous Carbon Films

Molecular dynamics simulation of the interaction of an Ar/CH4 plasma with a surface: Growth, structure, and sputtering of the deposited C:H films

Evolution of the Microstructure, Hybridization, and Internal Stress of Al-Doped Diamond-Like Carbon Coatings: A Molecular Dynamics Simulation