Abstract:The electrochemical performance of supercapacitors is suppressed by a large number of defects in the interface of heterostructure due to lattice mismatch. In this paper, the (001) oriented rutile MnO2 thin films with different thicknesses were grown on rutile TiO2 substrates. The lattice mismatch between film and substrate was minimized through a Ti diffusion self-adapting layer. The energy-dispersive spectroscopy mappings were used to measure the diffusion range of Ti. The results of high-resolution X-ray diffraction confirmed that the dependence of the out-of-plane lattice parameter on the thickness was consistent with the self-adapting interface model, indicating that Ti diffusion can indeed alleviate the lattice mismatch. In addition, the results of the synchrotron soft X-ray absorption spectrum indicated that the capacitance of the thin films with a large proportion of Ti diffusion increased with electrons involved in the reaction. Although the decrease of carrier density and conductivity of the thinner films depressed the electrochemical activity, it is worth mentioning that the film we designed still has considerable specific capacitance even when it is very thin, which can provide a new idea for the development of thinner and larger capacity potential micro-supercapacitors.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acsami.0c13532?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acsami.0c13532</a>.Experiments and fitting results of X-ray reflection, XRD pattern of MnO2 films after CV process, and XRD pattern of MnO2 films under different growth conditions (Figures S1–S3) (<a class="ext-link" href="/doi/suppl/10.1021/acsami.0c13532/suppl_file/am0c13532_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.

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