Convex Grid-Patterned Microstructures on Silicon Induced by Femtosecond Laser Assisted with Chemical Etching

Cong Wang,Yaxiang Tian,Zhi Luo,Yu Zheng,Fan Zhang,Kaiwen Ding,Ji'an Duan
DOI: https://doi.org/10.1016/j.optlastec.2019.105663
IF: 4.939
2019-01-01
Optics & Laser Technology
Abstract:The convex grid-patterned microstructures were fabricated on a silicon substrate by using femtosecond laser assisted with chemical etching in this study. Along the femtosecond laser scanning traces, the isosceles trapezoidal microstructures were generated. According to Raman spectra and elemental distribution, the formation of the convex microstructures is investigated. Also, the effect of experimental parameters including laser power, scanning speed, etching duration and etching temperature on the microstructures' three-dimensional size is discussed in detail. In addition, the hydrophobic property of a surface with large-area convex grid-patterned microstructures was explored.
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