An Extraction Method for the Interface Acceptor Distribution of GaN MOS-HEMT

Yijun Shi,Wanjun Chen,Ruize Sun,Chao Liu,Yun Xia,Yajie Xin,Xiaorui Xu,Fangzhou Wang,Xiaochuan Deng,Tangsheng Chen,Bo Zhang
DOI: https://doi.org/10.1109/ted.2019.2936509
IF: 3.1
2019-01-01
IEEE Transactions on Electron Devices
Abstract:This article presents a method for extracting the interface acceptor distribution of GaN metaloxide- semiconductor high electron mobility transistor (MOS-HEMT) using a compact 2-dimensional electron gas model. The presentedmethod is capable of self-consistently calculating the Fermi energy and the density of the ionized interface acceptor (n(it), A). Through the presented method, the density of states (DoS) of the interface acceptor (D-it, A) and nit, A are obtained. Especially, the DoS of the interface acceptor distributed close to the conductband is also obtained. The calculated results are well supported by the results from the ac conductance method and the subthreshold swing (SS)-based method, thus verifying the correctness of the presented method.
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