Proposal of Ferroelectric Based Electrostatic Doping for Nanoscale Devices

Siying Zheng,Jiuren Zhou,Harshit Agarwal,Jian Tang,Hongrui Zhang,Ning Liu,Yan Liu,Genquan Han,Yue Hao
DOI: https://doi.org/10.1109/led.2021.3063126
IF: 4.8157
2021-04-01
IEEE Electron Device Letters
Abstract:A ferroelectric based electrostatic doping (Fe-ED) technique is proposed, as the alternative to chemical doping, providing non-volatile and programmable free electrons and holes for nanoscale devices. We show that Fe-ED achieves non-volatility and reconfigurability via the ferroelectric film inserted into the polarity gate, producing the reconfigurable nanosheet FETs (NSFETs) without the requirement of a constant bias. Thanks to the naturally formed lightly doped drain structures and the extremely high doping concentration over $1times 10^{21}$ cm<sup>−3</sup> in source/drain (S/D) regions, Fe-ED NSFETs exhibit the promising potential benefits for device scaling including the improved subthreshold swing, the suppressed drain-induced barrier lowering, and the ultralow S/D region resistance. Our study suggests a promising doping strategy of Fe-ED for versatile reconfigurable nanoscale transistors and highly integrated circuits.
engineering, electrical & electronic
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