Creation and Migration of Intrinsic Defects in Si‐Doped Diamond Produced Using Microwave Plasma Chemical Vapor Deposition

Kaiyue Wang,Senchuan Ding,Yufei Zhang,Hong‐Xing Wang,Yuming Tian,Yingmin Wang,Yuesheng Chai
DOI: https://doi.org/10.1002/pssa.201900003
2019-01-01
Abstract:In this study, low temperature micro-photoluminescence technology is used to investigate the development and migration of intrinsic defects in Si-doped diamond. The results demonstrate that NV and Si-V luminescence are weakened due to the recombination of self-interstitials created by electron irradiation in diamond. After annealing at high temperatures, interstitial-related centers disappear and the vacancy migrate significant distances to isolated N and Si atoms for conversion into NV and Si-V centers.
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