Substitutional Doping: In Situ Oxygen Doping of Monolayer MoS 2 for Novel Electronics (Small 42/2020)
Jian Tang,Zheng Wei,Qinqin Wang,Yu Wang,Bo Han,Xiaomei Li,Biying Huang,Mengzhou Liao,Jieying Liu,Na Li,Yanchong Zhao,Cheng Shen,Yutuo Guo,Xuedong Bai,Peng Gao,Wei Yang,Lan Chen,Kehui Wu,Rong Yang,Dongxia Shi,Guangyu Zhang
DOI: https://doi.org/10.1002/smll.202070229
IF: 13.3
2020-10-01
Small
Abstract:<p>In article number <a href="https://doi.org/10.1002/smll.202004276">2004276</a>, Rong Yang, Guangyu Zhang, and co‐workers develop an in situ oxygen substitutional doping in MoS<sub>2</sub> monolayers by one step chemical vapor deposition process and lateral heterostructures with controlled doping concentrations are reliably fabricated. The bandgap tunability (from 2.25 to 1.75 eV) and n‐doping electronic properties are realized. This nondestructive oxygen doping technique holds great promise on future electronics based on 2D semiconductors. </p>
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology