A Lame Mode Resonator Based on Aluminum Nitride on Silicon Platform

Nan Wang,Yao Zhu,Guoqiang Wu,Zhipeng Ding,Eldwin Jiaqiang Ng,Nishida Yoshio,Peter Hyun Kee Chang,Navab Singh,Yuandong Gu
DOI: https://doi.org/10.1109/eptc.2018.8654380
2018-01-01
Abstract:A thin-film piezoelectric-on-silicon (TPoS) structured Lame mode resonator is experimentally reported in this work. The resonator is of a ring shape design and fabricated on the in-house AIN-on-SOI (silicon-on-insulator) platform. The thickness of the AlN layer and the device layer of the SOI is 1 mu m and 5 mu m, respectively, Experimental results show that the Lame mode can be excited at 60,6MHz, with loaded Q factors of 3617 in air and 4708 in vacuum, demonstrating great potential for the reported resonator for applications such as timing and inertial measurement,
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