Abstract:This work reports a far‐field femtosecond laser direct writing technology with a low‐numerical aperture objective lens for metallic nanowire array fabrication, bringing in ingenious tunability to break the diffraction limit by employing a spatially modulated dual‐peak vector beam. This method provides an alternative way for the fabrication of sub‐diffraction‐limit metallic nanowires in the field of flexible electric devices.Metallic nanowires have exhibited paramount importance in achieving functional electrical, electrochemical, and optical performances due to their unique physicochemical properties. Efficient fabrication of the nanowires with controllable geometry and line width is highly required in related applications. Here a new far‐field laser parallel direct writing approach for fabricating nanowire array far beyond the diffraction limit by a modulated vector beam with dual‐peak intensity distribution is reported. Such a modulated beam can perform selective laser ablation to fabricate nanowires, whose line width can be largely reduced by tuning the dual‐peak orientation relative to the laser scanning direction. As a demonstration, a 157 nm‐wide (less than λ/3) gold nanowire, reaching ≈1/20 of the diffraction limit, has been fabricated in far field by using a low numerical aperture microscope objective (NA = 0.1). The nanowire fabrication efficiency is also largely improved by applying multifocal modulated vector beams for parallel processing.

Patterned Direct-nanowriting of Metal Nanowires by Using Electron Beam Automatically

High-throughput and Parallel Direct Laser Writing System Based on Screen Division Multiplexing of Spatial Light Modulator

Direct Writing of Submicron Lines Using the Micro-and Nanofiber Pens

Laser Direct Writing Using Submicron-Diameter Fibers.

A General Approach For Fabricating Arc-Shaped Composite Nanowire Arrays By Pulsed Laser Deposition

Far‐Field Parallel Direct Writing of Sub‐Diffraction‐Limit Metallic Nanowires by Spatially Modulated Femtosecond Vector Beam

A General Approach for Fabricating Arc‐Shaped Composite Nanowire Arrays by Pulsed Laser Deposition

Nano-welding and Nano-Cutting with an Electron Beam

Nanometer-scale modification and welding of silicon and metallic nanowires with a high-intensity electron beam.

Electronic Nanostructures: Constructing Metal Arch Nanobridges Utilizing a Photothermal‐Induced Nanobonding Technique (adv. Electron. Mater. 7/2019)

Direct writing of suspended nanowires using coaxial electrohydrodynamic jet with double tip assistance

Nanoparticle Arrays Patterned by Electron-Beam Writing: Structure, Composition, and Electrical Properties.

Mask-Free Patterning of High-Conductivity Metal Nanowires in Open Air by Spatially Modulated Femtosecond Laser Pulses

Creating In‐Plane Metallic‐Nanowire Arrays by Corner‐Mediated Electrodeposition

Manipulation of Metallic and Semiconducting Nanowires with FETEM

Patterning of Metal Nanowire Networks: Methods and Applications

G030084 Fabrication of High Density Cu Nanowire Array by Template Method and Its Evaluation

Laser-induced Single Point Nanowelding of Silver Nanowires

Elaborately programmed nanowires fabricated using a tapered push-pull nozzle system.

A Universal Method to Weld Individual One-Dimensional Nanostructures with a Tungsten Needle Based on Synergy of the Electron Beam and Electrical Current

Writing of nanowires via high viscosity-induced nano diffusive layer