Patterned Direct-nanowriting of Metal Nanowires by Using Electron Beam Automatically

Mingyu Wang,Zhichao Chen,Zhan Yang,Tao Chen,Lining Sun,Toshio Fukuda
DOI: https://doi.org/10.1109/nano.2018.8626398
2018-01-01
Abstract:This paper presented a method of patterned direct-nanowriting of metal nanowires by using electron beam inside scanning electron microscopy (SEM). Nanowires interconnection technology was manual and inefficient, however direct-nanowriting of metal nanowires was achieved by controlling the position of electron beam automatically, which was efficient nanointerconnection technology. The electron beam was focused on metal nano particles inside SEM, which were dispersed on the ITO. At the same time, the metal nanowires grew in the direction where the electron beam moved. The method this paper presented realized direct-nanowriting of different routes to metal nanowires by using the same electron beam induced velocity, including the lines with different angle of 45°, 135°,225°,315°, and the circles with the radiu of 200 nm and 400 nm.
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