Techniques of Coating Wafers Used for Fabrication of Diffraction Optical Elements

QIU Ke-qiang,XU Xiang-dong,HONG Yi-lin,LIU Ying,FU Shao-jun
2007-01-01
Abstract:It is an important step to deposit uniform photoresist coatings on substrates in the process of manufacturing diffraction optical elements.Two coating techniques,dip coating and spin coating,which have been broadly used at present,were introduced.Their properties and influences on the thickness of coatings were analyzed.Especially,the main factors of influences on the uniformity of coatings were analyzed in detail and some methods of obtaining maximum uniformity of coatings were proposed.For the dip-coating,it is a good idea to select a photoresist solution with a high viscous coefficient and withdraw the substrate at a proper speed out from high viscous solution because the methods can reduce the effects of marangoni flow and van der Waals force on the uniformity of coatings.When the spin-coating is employed,it is recommended that the coating chamber should be airproofed or an air-controller should be used to make air keep a laminar flow so that the solution can be uniformly evaporated and the uniformity of the coating is increased.
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