Research on Film Thickness Homogeneity in Dip Coating

Junjian XIE,Mujun LI,Lianguan SHEN,Shengzhou HUANG

DOI: https://doi.org/10.3969/j.issn.1001-2257.2016.07.002

2016-01-01

Abstract:In the coating process ,a uniform thin film of photoresist is needed to deposit on the cylindri‐cal substrate by dip coating .And the homogeneity of the thin film is difficult to be controlled due to the fact it is associated with many factors .In this paper we mainly focus on two important factors :the with‐draw velocity and resting time between dip coating and soft bake .To explore the effect of these two factors the computational fluid dynamics Software -Fluent is employed to simulate the whole coating process .The simulation and experimental results show that the homogeneity of the liquid film would become worse with the increasing of the withdraw velocity .Before the cylindrical substrate is put into the oven ,the homoge‐neity of the liquid film would be better with the decreasing of the resting time .These results would be sig‐nificant for optimizing the dip coating process and enhancing the homogeneity of the liquid film .