Structure and Optical Properties of ZnMgO Thin Films Prepared by RF Magnetron Sputtering

HUANG Qiu-liu,FANG Liang,GUO Bei-dou,RUAN Hai-bo,WU Fang,KONG Chun-yang
DOI: https://doi.org/10.16136/j.joel.2010.07.005
2010-01-01
Abstract:A series of Zn1-xMgxO(x=0.00-0.16) films have been prepared on quartz substrates by RF magnetron sputtering.Several characterization techniques,including X-ray diffraction(XRD),scanning electron microscope(SEM),UV-Vis spectrophotometer,and photoluminescence measurement,have been used to investigate the crystal structure,surface morphology,and optical properties of the films,respectively.The results reveal that the obtained films with Mg content x up to about 0.1 are without phase separation;the films are uniform with grain size in the range of 100-150 nm;the optical transmittance is over 80%,and the band gap(Eg) has linear relationship with Mg content:Eg=2.03x+3.26(eV);the PL spectra of the films are composed of the weaker UV emission band and stronger visible band,and UV emission peak has a blue shift with the increase of Mg content.
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