Sub-10 Nm Vertical Tunneling Transistors Based on Layered Black Phosphorene Homojunction

Hong Li,Jing Lu
DOI: https://doi.org/10.1016/j.apsusc.2018.09.242
IF: 6.7
2018-01-01
Applied Surface Science
Abstract:Van der Waal (vdW) stacking of two-dimensional (2D) semiconductors owns a natural configuration for construction of vertical (interlayer) tunneling field effect transistors (TFETs). We simulate the vertical TFETs composed by layered black phosphorene (BP) homojunction at sub-10 nm scale from the ab initio quantum transport calculations. For high-performance (HP) application, the on-state currents (I-on) of the vertical BP TFETs outperform those of their planar counterparts under similar gate length (L-g) at sub-5 nm scale. Remarkably, the vertical BP TFETs extend the application field to low-power (LP) devices compared with their planar counterparts. Both I-on (LP) and I-on (HP) of the vertical BP TFETs can fulfill the LP and HP requirements of the international technology roadmap for semiconductors (ITRS) until L-g is scaled down to 5 and 3 nm, respectively.
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