Material Characterization And Device Simulation Of Gesn Alloys For Field-Effect Transistors Applications

Renrong Liang,Lei Liu,Jing Wang,Jun Xu
DOI: https://doi.org/10.1109/EDSSC.2016.7785300
2016-01-01
Abstract:GeSn alloys are promising materials for electronic device applications. In this paper, GeSn samples with relatively high Sn composition are characterized in detail. The electronic hand structures of GeSn alloys are calculated by nonlocal empirical pscudopotcntial method and the corresponding material parameters are extracted for device simulation. Based on the established GeSn parameter set, line-tunneling field-effect transistors with GeSn alloys as the source material are simulated and analyzed. It is shown that the GeSn/Ge hetero source structure effectively improves the device performance, especially at low supply voltages. The optimized GeSn tunneling devices are favorable for the future high-performance field-effect transistors.
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