Effect of Annealing Temperature on the Microstructure and Mechanical Properties of Ni-Mn-Ga-Gd Thin Film

Jian Yao,XiaoHang Zheng,Wei Cai,Jiehe Sui
DOI: https://doi.org/10.1016/j.jallcom.2016.10.252
IF: 6.2
2016-01-01
Journal of Alloys and Compounds
Abstract:The influence of rapid thermal annealing temperature on the microstructure, martensitic transformation and mechanical properties of Ni55.2Mn24.7Ga19.9Gd0.2 thin films was investigated. It was shown that as-deposited film displayed a coexistence of amorphous and austenite nano-crystals. When the annealing temperature was above 450 degrees C, Ni55.2Mn24.7Ga19.9Gd0.2 thin films possessed seven-layered modulated martensite structure. With annealing temperature increased from 450 degrees C to 750 degrees C, the average grain size of annealed films increased from 126 to 596 nm and the transformation temperature also increased gradually. Fracture strain of 6.1% and tensile strength of 636 MPa were obtained for the Ni55.2Mn24.7Ga19.9Gd0.2 thin film annealed at 550 degrees C. (C) 2016 Elsevier B.V. All rights reserved.
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