A Wide Temperature Tolerance, Solution-Processed MoOx Interface Layer for Efficient and Stable Organic Solar Cells

Cong Xu,Ping Cai,Xiaowen Zhang,Zheling Zhang,Xiaogang Xue,Jian Xiong,Jian Zhang

DOI: https://doi.org/10.1016/j.solmat.2016.09.009

2017-01-01

Abstract:While solution processable MoOx films (S-MoOx) are typically sensitive to thermal treatment temperature and oxygen, we report an approach with the features of a wide temperature tolerance, water-free and solution-processed S-MoOx film for organic solar cells (OSCs), The structural, morphological, electronic properties of synthesized S-MoOx film were studied in detail by using field emission scanning electron microscopy (SEM), Contact angle meter, UV–visible Spectrophotometer (UV–vis), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and scanning kelvin probe force microscopy (SKPFM). These analysis shows that the S-MoOx thin films possess the suitable morphology and electronic properties for application in OSCs. The S-MoOx film shows wide temperature tolerance from room temperature to 250°C. The S-MoOx was introduced into OSCs in normal and inverted configuration by acting as anode interface layer. The devices shows relatively high performance (ca 7.40%) based on varying temperature treated S-MoOx. The stability of the OSCs is dramatically enhanced via using the S-MoOx layers replace the conventional PEDOT:PSS layer both in air and in nitrogen atmosphere.