Fabrication of Electron-Beam Excited Plasma Process Reactor with a Polymer Interface

Ryoichi Inanami,Tsuyoshi Naganawa,Chunlin Shao,Shinzo Morita
DOI: https://doi.org/10.1541/ieejeiss1987.113.9_669
1993-01-01
Abstract:The apparatus for electron-beam excited plasma (EBEP) processes with an interface of polymer films was developed, which is composed with a reactor and an electron beam source vessel, which are separated by the polyester film of 1.5μm. The electron source is heated tungsten wire. The acceralated electron-beam was expected to be transmitted through the polymer film according to the space charge limited current law. The electron temperature in the plasma was measured to be 10_??_14 eV by a probe-measurement. When styrene vapor was filled at a pressure of 0.2 Torr, polymerized film was deposited on the substrate, which was confirmed to contain polymerized styrene. But the polymer interface was abrated at the large electron-beam current of 100μA, and the abrated polymer was observed to be deposited on the substrate. In CF4 gas, 0.5μm lines on mask resist were transfered to Si wafer successuflly by this process.
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