PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Teresa de los Arcos,Peter Awakowicz,Jan Benedikt,Beatrix Biskup,Marc Böke,Nils Boysen,Rahel Buschhaus,Rainer Dahlmann,Anjana Devi,Tobias Gergs,Jonathan Jenderny,Achim von Keudell,Thomas D. Kühne,Simon Kusmierz,Hendrik Müller,Thomas Mussenbrock,Jan Trieschmann,David Zanders,Frederik Zysk,Guido Grundmeier

2023-06-21

Abstract:This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well as mechanical engineering over the last years, mostly within the frame of the transregional project SFB-TR 87 ("Pulsed high power plasmas for the synthesis of nanostructured functional layers"). This feature article aims at bridging the gap between the understanding of plasma processes in the gas phase and the resulting surface and interface processes of the polymer. The results show that interfacial adhesion and initial film growth can be well controlled and even predicted based on the combination of analytical approaches.

Soft Condensed Matter,Materials Science

What problem does this paper attempt to address?

### Problems the Paper Attempts to Solve

This paper aims to explore the fundamental principles and analytical methods in the thin film growth process on polymer substrates using Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Enhanced Atomic Layer Deposition (PEALD). Specifically, the paper focuses on the following aspects:

1. **Interaction between Plasma and Polymer Substrates**:
- Investigate the activation effect of plasma on polymer surfaces, including how to generate polar groups on low-energy polymer surfaces.
- Analyze the fundamental reaction mechanisms on the polymer surface during plasma activation and the impact of these reactions on subsequent thin film growth.

2. **Nucleation and Growth of Ultrathin Plasma Films**:
- Explore the nucleation and growth processes of thin films on model substrates and technical polymer substrates using PECVD and PEALD processes.
- Compare the effects and mechanisms of different processes (such as PECVD, PEALD, and their combinations) in thin film growth.

3. **Application of In-situ Analytical Techniques**:
- Introduce in-situ analytical methods used to analyze plasma volume and plasma/substrate interfaces to better understand plasma processes and their effects on surfaces and interfaces.
- Combine experimental data and theoretical models to explore how to predict and optimize surface chemical reactions by controlling plasma parameters.

4. **Impact of Plasma Activation on Polymer Substrate Properties**:
- Analyze the impact of plasma activation on the surface energy, wettability, and adhesion of polymer substrates.
- Explore the key role of plasma activation in enhancing the bonding strength between the thin film and the substrate.

5. **Challenges and Prospects in Practical Applications**:
- Discuss the potential applications of plasma thin film technology in fields such as packaging materials and membrane separation.
- Analyze the current challenges in research, such as interface reaction analysis at the molecular level and process control.

In summary, this paper aims to bridge the understanding gap between plasma processes and gas-phase and polymer surface/interface reactions by integrating the latest research findings, providing theoretical and technical support for future applications.