Study on New Method of MEMS Monolithic Integration and Its Key Technology

王晓红,谭智敏,刘理天,李志坚
2001-01-01
Abstract:A new method for MEMS monolithic integration-post micromachining technique compatible with IC standard technology is presented. The key related techinques are studied:integrated circuits protection technique by SiC deposited by PECVD and porous silicon sacrifitial layer technique. The experimental research of porous silicon sacrificial layer technique has been carried out and good results obtained.
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