Characteristics and Fabrication Technology of GaN Nanowire Material

谢自力,张荣,修向前,毕朝霞,刘斌,江若琏,沈波,顾书林,韩平,朱顺明,施毅,郑有炓
DOI: https://doi.org/10.3969/j.issn.1672-6030.2004.03.005
2004-01-01
Nanotechnology and Precision Engineering
Abstract:GaN is a kind of wide band gap semiconductor materials.The outstanding thermal and chemical stability of GaN enable it and its devices to operate at high temperature and in hostile environments,also makes it attractive to high microwave power application.During the last few years,since the field has been revolutionized by success in fabrication GaN blue LEDs, GaN qualify as the hottest topic in compound semiconductor research.The latest progress of the characteristics of GaN nanowires and their fabrication technology are reviewed in this paper. The diameter of the nanowires has been 5-12 nm, the length is about hundreds of micrometers. The nanowires are single crystal with hexagonal wurzite structure and their PL spectra show a broad emission peak centered at 420 nm. The GaN nanowires have been applied to fabricate the Schottky diode.
What problem does this paper attempt to address?