Abstract:The near-field photolithography technique (NFPT) offers a new approach of nanolithography for a dramatic increase in the resolution with high throughput and low cost. The NFPT utilizes the same flight principle as that of the magnetic head of hard-disk drives but replacing the magnetic head with a plasmonic flying head. The plasmonic flying head, which can focus the incident laser beam to a spot size of sub-20 nm with an enhanced field intensity by exciting surface plasmon polaritons, takes off and then flies steadily above the revolving disk coated by a photoresist film to be patterned with a narrow gap of tens of nanometers. As a key foundation of the NFPT, the take off and flight stability of the plasmonic flying head affects the pattern density and the fabrication efficiency. This work proposed and investigated a molecular glass photoresist, named FPT-8Boc, for the large-scale consistent fabrication with the NFPT. To overcome the take-off problem of the head over the soft photoresist film, a transition zone is intentionally formed by washing off the coated photoresist in the outer area of the disk using a solvent. The simulation results by COMSOL Multiphysics software and quasi-Newton iteration method review that the matched transition zone height with spreading length can guarantee the flight stability of the plasmonic flying head on the soft photoresist. Using this method, a preliminary photolithography result with a 31 nm line width has been achieved.

40 Nm Thick Photoresist-Compatible Plasmonic Nanolithography Using a Bowtie Aperture Combined with a Metal-Insulator-metal Structure

Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer.

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Light and Matter Co-Confined Multi-Photon Lithography

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Photolithography Using Lateral Surface of Nanofibers

Near Field Optical Lithography Using Ultra-Small Gap Bowtie Apertures

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Laser interaction with a MIM nanostructure including bowtie aperture and cylindrical holes for plasmonic field enhancement based on strong coupling of LSPR and SPPs

Plasmonic Direct-Writing Lithography Via High Numerical Aperture Objectives.

Development of Next-Generation Nanolithography Methods to Break the Optical Diffraction Limit

Plasmonic Nanolithography Based on Cavity Resonance Through Thick Metal Mask

Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size

Parallel Optical Nanolithography Using Nanoscale Bowtie Aperture Array.

Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna

16Nm Resolution Lithography Using Ultra-Small Gap Bowtie Apertures

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Maskless Nanostructure Photolithography by Ultrahigh-Order Modes of a Symmetrical Metal-Cladding Waveguide

The Steady Flying Of A Plasmonic Flying Head Over A Photoresist-Coated Surface In A Near-Field Photolithography System