Abstract:Abstract Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor ( F ) as a function of gap size is defined to quantitatively evaluate the strong near-field enhancement effect excited by a plasmonic BNA, which also reveals that the high enhancement of the evanescent field is due to the strong resonant coupling between the plasmonic waveguide and the surface plasmon waves (SPWs). However, based on an investigation of the physical origin of the near-field OPE, and the theoretical calculations and simulation results indicate that the evanescent-field-induced rapid loss of high- k information is one of the main optical contributors to the near-field OPE. Furthermore, an analytic formula is introduced to quantitatively analyze the effect of the rapidly decaying feature of the evanescent field on the final exposure pattern profile. Notably, a fast and effective optimization method based on the compensation principle of the exposure dose is proposed to reduce the pattern distortion by modulating the exposure map with dose leveling. The proposed pattern quality enhancement method can open new possibilities in the manufacture of nanostructures with ultrahigh pattern quality via plasmonic lithography, which would find potentially promising applications in high density optical storage, biosensors, and plasmonic nanofocusing.

Plasmonic Nanolithography Based on Cavity Resonance Through Thick Metal Mask

High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

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Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

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High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Surface-plasmon-assisted nanoscale photolithography by polarized light

Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

“Seeing” the Resonant SPP Modes Confined in Metal Nanocavity Via Cathodoluminescne Spectroscopy

Fabrication of Plasmonic Cavity and Indefinite Metamaterial by Laser-Induced Forward Transfer

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Plasmonics as a fabrication tool