Abstract:High-aspect ratio x-ray absorption gratings are required for hard x-ray or high-resolution soft x-ray phasecontrast imaging (XPCi) applications. X-ray gratings play a central role in grating-based XPCi techniques, where visibility – image quality – is highly dependent on the quality of gratings. Although the fabrication process of x-ray gratings for soft x-ray imaging is well-developed, there are technological challenges in highresolution hard x-ray imaging that impede us from making high-aspect ratio large field-of-view fine x-ray gratings through conventional fabrication processes. Here we present a design and a fabrication process to fabricate highaspect ratio gratings that benefit from a self-aligned hard-mask – a patterned chromium-gold-chromium thin film deposited on a transparent ITO-on-glass substrate – which facilitates both lithography and electroplating processes. The repeatability of the proposed method makes it suitable for achieving high-aspect ratio fine structures as thick as desired through a multi-layer structure without any restraint or limitation on the aspect ratio of features. The multi-layer structure design overcomes the aspect ratio limitation associated with UVlithography. Although this method works well with X-ray lithography, the key advantage of this design is that it enables UV lithography for high-aspect ratio grating fabrication through a reliable yet simple process. To the best of our knowledge, self-aligned multi-layer SU-8 based grating design has not been previously reported. The proposed design and fabrication process help researchers further develop x-ray gratings performance to facilitate high-resolution coded-aperture and Talbot-Lau high-energy x-ray phase-contrast imaging.

Alignment Method for Fabricating a Parallel Flat-Field Grating Used in Soft X-Ray Region.

Design of Multi-Area Grating for Soft X-Ray Flat-Field Spectrograph.

Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer

Fabrication of a Two-Dimensional Diffraction Grating by a Two-Axis Lloyd's Mirror Interferometer

A Method of Fabricating Wide Spectrum Flat-Field Concave Grating with Compensation Concave Lens

Design and Fabrication of Soft X-ray Double Frequency Grating

Optimum Design of A Holographic Parallel Flat-Field Grating

Analysis and Simulation of Spatial Phase Alignment for Fabrication of Double-Layer Grating

Improving the Spectral Resolution of Soft X-Ray Flat-Field Spectrometer with Multi-Area Gratings

Global Alignment Reference Strategy for Laser Interference Lithography Pattern Arrays

Fabrication of ultra-high aspect ratio silicon grating using an alignment method based on a scanning beam interference lithography system

Design and fabrication of soft x-ray blazed diffraction gratings

Alignment Method Combining Interference Lithography with Anisotropic Wet Etch Technique for Fabrication of High Aspect Ratio Silicon Gratings.

Model for the Calculation of Slant Grating Alignment Signals of Room-Temperature Imprint Lithography

Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method

Holographic Fabrication of Large-Constant Concave Gratings for Wide-Range Flat-Field Spectrometers with the Addition of a Concave Lens.

Errors Analysis of Flat-Field Gratings Fabricated by EBL-NFH and Errors Compensation

The Design, Fabrication and Performance of A Large Area 10000 Line/Mm Metal Transmission Diffraction Gratings for Soft X-Ray

Fabrication of Optical Mosaic Gratings: a Self-Referencing Alignment Method

Self-aligned fabrication of high-aspect ratio high-resolution x-ray gratings

Performance of a Soft X-ray Splitter Grating Parallelism Measuring System by Diffraction Method