Record‐Low Subthreshold‐Swing Negative‐Capacitance 2D Field‐Effect Transistors
Yang Wang,Xiaoyuan Bai,Junwei Chu,Hongbo Wang,Gaofeng Rao,Xinqiang Pan,Xinchuan Du,Kai Hu,Xuepeng Wang,Chuanhui Gong,Chujun Yin,Chao Yang,Chaoyi Yan,Chunyang Wu,Yao Shuai,Xianfu Wang,Min Liao,Jie Xiong
DOI: https://doi.org/10.1002/adma.202005353
IF: 29.4
2020-10-12
Advanced Materials
Abstract:<p>Power consumption is one of the most challenging bottlenecks for complementary metal‐oxide–semiconductor integration. Negative‐capacitance field‐effect transistors (NC‐FETs) offer a promising platform to break the thermionic limit defined by the Boltzmann tyranny and architect energy‐efficient devices. However, it is a great challenge to achieving ultralow‐subthreshold‐swing (SS) (10 mV dec<sup>−1</sup>) and small‐hysteresis NC‐FETs simultaneously at room temperature, which has only been reported using the hafnium zirconium oxide system. Here, based on a ferroelectric LiNbO<sub>3</sub> thin film with great spontaneous polarization, an ultralow‐SS NC‐FET with small hysteresis is designed. The LiNbO<sub>3</sub> NC‐FET platform exhibits a record‐low SS of 4.97 mV dec<sup>−1</sup> with great repeatability due to the superior capacitance matching characteristic as evidenced by the negative differential resistance phenomenon. By modulating the structure and operating parameters (such as channel length (<i>L</i><sub>ch</sub>), drain–sourse bias (<i>V</i><sub>ds</sub>), and gate bias (<i>V</i><sub>g</sub>)) of devices, an optimized SS from ≈40 to ≈10 mV dec<sup>−1</sup> and hysteresis from ≈900 to ≈60 mV are achieved simultaneously. The results provide a new potential method for future highly integrated electronic and optical integrated energy‐efficient devices.</p>
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology