Transparent pn junction of Mg:NiO/ZnO/SnO 2 via potential regulation and carrier injection of ZnO transition layer

Tianyu Shu,Lixin Que,Lei Lu,Yunlong Xu,Jun Cao,Lei Shi,Jiaqi Pan,Chaorong Li
DOI: https://doi.org/10.1016/j.mtcomm.2023.107373
IF: 3.8
2023-10-25
Materials Today Communications
Abstract:Transparent pn junction of Mg:NiO/ZnO/SnO 2 is prepared via an approach of continuous co-sputtering-annealing method. The Mg:NiO/ZnO/SnO 2 pn junction exhibits high transmittance of ∼70–85 % in visible light, obvious photovoltaic enhancement of ∼1.6 × 10 2 folds than that of unmodified Mg:NiO/SnO 2 , stable output during 9 weeks' cycle. It's mainly attributed to the ultrathin ZnO transition layer, obtaining appropriate Fermi level and higher intrinsic carrier concentration can optimize carrier equilibrium, meanwhile sustaining high transparency and providing interface optimization. Furthermore, the extra hole carrier caused by Ni vacancy and Ni 2+ /Ni 3+ mixed state can take full advantage of the defects to optimize the kinetic equilibrium. Additionally, the intrinsic high physical-chemical properties of inorganic NiO, ZnO and SnO 2 can increase the intrinsic stability.
materials science, multidisciplinary
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