Abstract:In this paper, we developed a top-down method to fabricate complex three dimensional silicon structure, which was inspired by the hierarchical micro/nanostructure of the Morpho butterfly scales. The fabrication procedure includes photolithography, metal masking, and both dry and wet etching techniques. First, microscale photoresist grating pattern was formed on the silicon (111) wafer. Trenches with controllable rippled structures on the sidewalls were etched by inductively coupled plasma reactive ion etching Bosch process. Then, Cr film was angled depositedon the bottom of the ripples by electron beam evaporation, followed by anisotropic wet etching of the silicon. The simple fabrication method results in large scale hierarchical structure on a silicon wafer. The fabricated Si structure has multiple layers with uniform thickness of hundreds nanometers. We conducted both light reflection and heat transfer experiments on this structure. They exhibited excellent antireflection performance for polarized ultraviolet, visible and near infrared wavelengths. And the heat flux of the structure was significantly enhanced. As such, we believe that these bio-inspired hierarchical silicon structure will have promising applications in photovoltaics, sensor technology and photonic crystal devices.

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Selective Etching of Sr-Modified and Directionally Solidified Industrial Al–Si Eutectic Alloys for Fabricating Fibrous Eutectic Si

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Wafer-scale Fabrication of Silicon Nanowire Arrays with Controllable Dimensions

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High-fidelity Moulding Growth and Cross-section Shaping of Ultrathin Monocrystalline Silicon Nanowires

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Controlled Fabrication of Hierarchically Branched Nanopores, Nanotubes, and Nanowires.

Assembly of Silica Rods into Tunable Branched Living Nanostructures Mediated by Coalescence of Catalyst Droplets

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching

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