The Surface Passivation on the Optical and Surface Properties of InP

Xian Gao,ZhiPeng Wei,Dan Fang,Haifeng Zhao,Xuan Fang,Shanshan Tian,Jilong Tang,Peng Du,Xueying Chu,Jinhua Li,Fang,Xiaohua Wang
DOI: https://doi.org/10.4028/www.scientific.net/amr.924.181
2014-01-01
Advanced Materials Research
Abstract:We propose a novel surface passivation of InP, to obtain the strong luminescence property and completely remove the surface state. InP is passivated by (NH4)2S solution, then treated by rapid thermal annealing (RTA) at different temperatures. Compared with unannealing sample, the PL intensity is increased to 1.7 times. We adopt atomic layer deposition (ALD) of Al2O3 avoiding oxidizing gradually.
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