Thermodynamics of the Production of Condensed Phases in the Chemical Vapor Deposition of ZrC in the ZrCl4–CH4–H2–Ar System

Haiping Liu,Juanli Deng,Lianli Yang,Laifei Cheng,Lei Luo,Yan Zhu,Kehe Su,Litong Zhang

DOI: https://doi.org/10.1016/j.tsf.2014.03.023

IF: 2.1

2014-01-01

Thin Solid Films

Abstract:Production conditions of ZrC, Zr and C(graphite) condensed phases in the chemical vapor deposition process with ZrCl4–CH4–H2–Ar precursor system have been investigated based on thermodynamic analyses using the FactSage code. The yields of condensed phases have been examined as functions of the injected reactant ratios of ZrCl4/(ZrCl4+CH4), H2/(ZrCl4+CH4) and Ar/(ZrCl4+CH4), the temperature and the pressure. The results show that the yields strongly depend on the molar ratios of the ZrCl4/(ZrCl4+CH4) and H2/(ZrCl4+CH4) injected reactant and on the temperature, but are insensitive to the inert gas Ar ratio and pressure. The co-deposition of ZrC with Zr or C(graphite) can be easily controlled by changing the ratios of ZrCl4/CH4 and H2/(ZrCl4+CH4). Process conditions such as high input amount of H2, relatively low amount of Ar, low pressure and temperature above 1300K are favorable for the deposition of ZrC. The results of this work will be helpful for further experimental investigation on different deposition conditions.