Extraction of Channel Length Independent Series Resistance for Deeply Scaled Metal-Oxide-Semiconductor Field-Effect Transistors

Ma Li-Juan,Ji Xiao-Li,Chen Yuan-Cong,Xia Hao-Guang,Zhu Chen-Xin,Guo Qiang,Yan Feng
DOI: https://doi.org/10.1088/0256-307x/31/9/097302
2014-01-01
Abstract:The recently developed four R-sd extraction methods from a single device, involving the constant-mobility method, the direct I-d V-gs method, the conductance method and the Y-function method, are evaluated on 32nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that R-sd achieved from the constant-mobility method exhibits the channel length independent characteristics. The L-dependent R-sd extracted from the other three methods is proven to be associated with the gate-voltage-induced mobility degradation in the extraction procedures. Based on L-dependent behaviors of R-sd, a new method is proposed for accurate series resistance extraction on deeply scaled MOSFETs.
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