Direct Extraction Methods for RF Characterization of Extrinsic Parasitic Parameters in 28 nm FDSOI MOSFETs Up to 110 GHz

Xuejing Yang,Kyounghoon Yang
DOI: https://doi.org/10.1109/jeds.2024.3486736
2024-11-09
IEEE Journal of the Electron Devices Society
Abstract:In this paper, we report on newly introduced direct extraction methods applied for determining the extrinsic parasitic capacitances and inductances in RF test structures of Fully-Depleted-Silicon-On-Insulator (FDSOI) MOSFETs with a 28 nm gate length. Our approach leverages dummy structures and employs closed-form extraction techniques for precise parasitic parameter determination. Notably, we apply the closed-form extraction strategy for the first time to quantify the parasitic inductances of RF FDSOI-MOSFETs. To verify the accuracy of our extraction results based on a direct approach without optimization, we perform error analysis by comparing the modeled S-parameters of the small signal equivalent circuit to the measured results. Good agreement between the modeled and measured results not only at the cold bias but also at the saturation-mode operation region is achieved up to 110 GHz.
engineering, electrical & electronic
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