Abstract:The diamond microchannel heat sink has attracted much attention recently owing to its excellent heat dissipation performance. However, the difficulty in processing expected microchannels on the self-supporting diamond substrate and the high price restrict its applications. In this paper, a new strategy is proposed to prepare diamond microchannels, that is, depositing diamond microchannels on a micro-grooved graphite substrate with a Mo nucleation layer. The effects of micro-grooves width on the deposition environment, structure, and diamond growth process are investigated by combining the experiments and numerical simulations. The results show that the electric field intensity at the center of the micro-groove bottom is the lowest, which increases gradually with the increase of the micro-groove width. This variation affects the diamond deposition in the micro-grooves. With the rise of the micro-groove width, the deposition form of the carbon atoms in the plasma translates from sp2 to sp3. The films deposited at the bottom center of the micro-grooves change from graphene nanosheets to a mixture of graphite and diamond, and then to well-crystallized diamond. The morphology of the diamond films translates from the graphite, and nanocrystalline diamond co-existed globular clusters to (110) oriented microcrystalline pyramid diamond grains with a rectangular top, and then to (111) oriented holonomic pyramid grains. Similar continuous and dense diamond films can also be obtained at the micro-groove top when the micro-groove width is over 630 μm. The investigation in this paper indicates that this new strategy is feasible and promising in manufacturing diamond microchannel heat sinks.

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