Solution Processable Amorphous Hafnium Silicate Dielectrics and Their Application in Oxide Thin Film Transistors

Y. N. Gao,Y. L. Xu,J. G. Lu,J. H. Zhang,X. F. Li
DOI: https://doi.org/10.1039/c5tc02485d
IF: 6.4
2015-01-01
Journal of Materials Chemistry C
Abstract:Novel solution-processed amorphous high-k dielectrics for thin film transistors (TFTs) have been systemically studied with the objective of achieving high performance and reducing costs for the next generation displays.
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