Study of Organic Thin-film Transistor on Silicon Nitride Gate Dielectrics for Integration in Display Circuits and Arrays

Flora M. Li,Yiliang Wu,Beng S. Ong,Arokia Nathan
DOI: https://doi.org/10.1109/leos.2006.279200
2006-01-01
Abstract:The gate dielectric plays an important function in establishing field-effect operation in organic thin-film transistors (OTFTs). A variety of gate dielectric materials has been investigated and reported for OTFTs. This paper focuses on the use of silicon nitride (SiNx ), deposited by plasma-enhanced chemical vapour deposition (PECVD). Attractive attributes of SiNx include low temperature deposition, large-area capability, and good dielectric strength. Various compositions of SiNx films, ranging from N-rich to Si-rich, are explored to determine an optimal choice for OTFT fabrication. The development of OTFT pixel circuits with silicon nitride dielectric for active matrix display backplanes will also be addressed
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