Planar Nanoscale Architecture for Organic Thin-Film Field-Effect Transistors

Daniel H. Fine,Liang Wang,Deepak Sharma,Ananth Dodabalapur
DOI: https://doi.org/10.1063/1.2388569
IF: 4
2006-01-01
Applied Physics Letters
Abstract:A nanoscale architecture for an organic thin-film field-effect transistor is presented. It comprises an aluminum gate electrode, which forms its own oxide in air, placed near a titanium/gold source, and drain electrodes in the same horizontal plane. The gate to channel separation is about 50nm with the channel length also being around 50nm for the best performing devices. Although pentacene is used for the purpose of device demonstration, this architecture lends itself well to any organic or polymer semiconductor as well as the possibility for molecular devices.
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