Abstract:Pairs of electrodes with nanometer separation (nano-gap) are achieved through an electromigration-induced break-junction (EIBJ) technique at room temperature. Lithographically defined gold (Au) wires are formed by e-beam evaporation over oxide coated silicon substrates silanized with (3-Mercaptopropyl)trimethoxysilane (MPTMS) and then subjected to electromigration at room temperature to create a nanometer scale gap between the two newly formed Au electrodes. The Si-O-Si covalent bond at the SiO$_2$ surface and the Au-sulphur (Au-S) bond at the top evaporated Au side, makes MPTMS as an efficient adhesive monolayer between SiO$_2$ and Au. Although the Au wires are initially 2$\mu$m wide, gaps with length $\sim$1nm and width $\sim$5nm are observed after breaking and imaging through a field effect scanning electron microscope (FESEM). This technique eliminates the presence of any residual metal interlink in the adhesion layer (chromium or titanium for Au deposition over SiO$_2$) after breaking the gold wire and it is much easier to implement than the commonly used low temperature EIBJ technique which needs to be executed at 4.2 K. Metal-molecule-metal structures with symmetrical metal-molecule contacts at both ends of the molecule, are fabricated by forming a self-assembled monolayer of -dithiol molecules between the EIBJ created Au electrodes with nanometer separation. Electrical conduction through single molecules of 1,4-Benzenedimethanethiol (XYL) is tested using the Au/XYL/Au structure with chemisorbed gold-sulfur (Au-S) coupling at both contacts.

Atom-Size Gaps And Contacts Between Electrodes Fabricated With A Self-Terminated Electrochemical Method

Electrostatically Assembled Metallic Point Contacts

Electrochemical Fabrication of Atomically Thin Metallic Wires and Electrodes Separated with Molecular-Scale Gaps

A Device Structure for Electronic Transport Through Individual Molecules with Strong Coupling to Metallic Electrodes

Fabricating Atom-Sized Gaps by Field-Aided Atom Migration in Nanoscale Junctions

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

Fabrication of nanometer-spaced electrodes using gold nanoparticles

Self-aligned Split Gate Electrodes Fabricated on Suspended Carbon Nanotubes

Measurement of Electron Transport Properties of Molecular Junctions Fabricated by Electrochemical and Mechanical Methods

Controlling Electron Transfer through Single Molecules

Pairs of Gold Electrodes with Nanometer Separation Performed over SiO$_2$ Substrates with a Molecular Adhesion Monolayer

Real Time and in Situ Control of the Gap Size of Nanoelectrodes for Molecular Devices

Formation of Atomic Point Contacts and Molecular Junctions with a Combined Mechanical Break Junction and Electrodeposition Method

Fabrication of Asymmetric Electrode Pairs with Nanometer Separation Made of Two Distinct Metals

Extending the Capability of Stm Break Junction for Conductance Measurement of Atomic-Size Nanowires: an Electrochemical Strategy

Chemical fabrication of heterometallic nanogaps for molecular transport junctions.

Quantum Transport In Metallic Nanowires Fabricated By Electrochemical Deposition/Dissolution

Quantized Tunneling Current in the Metallic Nanogaps Formed by Electrodeposition and Etching

Models of Electrodes and Contacts in Molecular Electronics

Metal–Molecule–Metal Junctions on Self-Assembled Monolayers Made with Selective Electroless Deposition

Length-dependent Conductance of Molecular Wires and Contact Resistance in Metal-Molecule-metal Junctions.