Quantized Tunneling Current in the Metallic Nanogaps Formed by Electrodeposition and Etching

CZ Li,HX He,NJ Tao
DOI: https://doi.org/10.1063/1.1332406
IF: 4
2000-01-01
Applied Physics Letters
Abstract:We have studied electron tunneling across the gap between two electrodes as the gap is varied by electrodeposition and etching. The tunneling current tends to change in a stepwise fashion, corresponding to a discrete change of the gap width. The stepwise change is due to the discrete nature of atoms and a series of structural relaxations of the atoms at the electrodes between stable configurations upon deposition and etching. By stabilizing the tunneling current on various steps using a feedback loop, we have demonstrated that stable molecular-scale gaps can be fabricated with subangstrom precision.
What problem does this paper attempt to address?