Ajit K. Mahapatro,Subhasis Ghosh,David B. Janes
Abstract:Pairs of electrodes with nanometer separation (nano-gap) are achieved through an electromigration-induced break-junction (EIBJ) technique at room temperature. Lithographically defined gold (Au) wires are formed by e-beam evaporation over oxide coated silicon substrates silanized with (3-Mercaptopropyl)trimethoxysilane (MPTMS) and then subjected to electromigration at room temperature to create a nanometer scale gap between the two newly formed Au electrodes. The Si-O-Si covalent bond at the SiO$_2$ surface and the Au-sulphur (Au-S) bond at the top evaporated Au side, makes MPTMS as an efficient adhesive monolayer between SiO$_2$ and Au. Although the Au wires are initially 2$\mu$m wide, gaps with length $\sim$1nm and width $\sim$5nm are observed after breaking and imaging through a field effect scanning electron microscope (FESEM). This technique eliminates the presence of any residual metal interlink in the adhesion layer (chromium or titanium for Au deposition over SiO$_2$) after breaking the gold wire and it is much easier to implement than the commonly used low temperature EIBJ technique which needs to be executed at 4.2 K. Metal-molecule-metal structures with symmetrical metal-molecule contacts at both ends of the molecule, are fabricated by forming a self-assembled monolayer of -dithiol molecules between the EIBJ created Au electrodes with nanometer separation. Electrical conduction through single molecules of 1,4-Benzenedimethanethiol (XYL) is tested using the Au/XYL/Au structure with chemisorbed gold-sulfur (Au-S) coupling at both contacts.
What problem does this paper attempt to address?
The key problem that this paper attempts to solve is how to fabricate a pair of gold electrodes with nanoscale spacing by electromigration - induced break - junction (EIBJ) technology at room temperature, and use these electrodes to study the single - molecule conductance characteristics. Specifically, the author hopes to overcome several challenges in traditional methods through this method:
1. **Achievement of nanoscale electrode spacing**: In the traditional metal - molecule - metal (M - M - M) structure, it is difficult to precisely control the spacing between electrodes to the molecular scale. This research achieves this goal at room temperature through EIBJ technology, avoiding the complexity of low - temperature operation.
2. **Elimination of residual metal interconnections**: In the traditional electrode preparation process, titanium or chromium is usually used as an adhesion layer to enhance the binding force between gold and the silicon substrate, but this will lead to the problem of metal residue after fracture. In this study, by using (3 - mercaptopropyl)trimethoxysilane (MPTMS) as a molecular adhesion monolayer, this residual metal interconnection has been successfully eliminated.
3. **Construction of symmetric metal - molecule contacts**: In order to accurately measure the conductance characteristics of a single molecule, it is necessary to ensure that the contacts between both ends of the molecule and the metal electrodes are symmetric. In this study, through the self - assembled monolayer (SAM) technology, a dithiol molecule (such as 1,4 - benzenedimethanethiol, XYL) was introduced between the two newly formed gold electrodes to form a symmetric Au - S bond.
### Research background and significance
In the fields of nanotechnology and molecular electronics, studying the electrical transport characteristics of single molecules is crucial for understanding the electronic behavior at the molecular level. However, due to the lack of effective means to define the electrode structure with molecular - scale spacing, this research faces many challenges. This study provides a simple and efficient method that can achieve nanoscale electrode spacing at room temperature and has been successfully applied to the measurement of single - molecule conductance characteristics. This lays the foundation for the future development of efficient nano/biologically - inspired devices.
### Main experimental steps
1. **Substrate treatment**: First, a 5000 Å - thick thermally oxidized silicon substrate was silanized with MPTMS to form Si - O - Si covalent bonds and Au - S bonds.
2. **Gold electrode deposition**: A 200 Å - thick gold electrode was deposited on the silanized substrate by electron - beam evaporation, and 4000 Å - thick gold pads were connected at both ends to achieve electrical connection.
3. **Electromigration - induced break - junction**: By applying a linearly increasing voltage, the gold electrode undergoes electromigration, and finally a nanoscale gap is formed in the high - current - density region.
4. **Characterization and measurement**: The formed nanogap was characterized by using a field - effect scanning electron microscope (FESEM) and I - V characteristic tests to verify its size and conductance characteristics.
### Conclusion
This study successfully achieved nanoscale electrode spacing at room temperature through EIBJ technology, and eliminated the residual metal interconnection by introducing the MPTMS molecular adhesion monolayer. In addition, a symmetric metal - molecule - metal structure was successfully constructed, and the conductance characteristics of the single - molecule 1,4 - benzenedimethanethiol were measured. This achievement provides new ideas and technical means for the research of nanotechnology and molecular electronics.