Mechanical Properties of Β-Si3n4 Thin Layers in Basal Plane under Tension: A Molecular Dynamics Study

Xuefeng Lu,Meng Chen,Lei Fan,Chao Wang,Hongjie Wang,Guanjun Qiao
DOI: https://doi.org/10.1063/1.4788692
IF: 4
2013-01-01
Applied Physics Letters
Abstract:The mechanical properties and failure mechanisms of the β-Si3N4 thin layers in basal plane under uniaxial tension are investigated by using molecular dynamics simulations. It is found that the thin layers display a nonlinear stress-strain relationship first at ε < 0.06, and then a linear response at 0.06 < ε < 0.09, and finally the stresses increase nonlinearly with the strains until fracture occurs. The fracture stresses and strains increase with increasing the side lengths of the thin layers, and the trend is same for Young's moduli accompanying little anisotropy. The deterioration in mechanical properties derives from the N6h-Si bonds where the fracture is initiated.
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