Low-Cost Shrink Lithography With Sub-22nm Resolution

bo zhang,min zhang,tianhong cui
DOI: https://doi.org/10.1063/1.3697836
IF: 4
2012-01-01
Applied Physics Letters
Abstract:A low-cost shrink lithogragphy technique with 21 nm resolution is presented in this paper. The shrink lithography uses embossing approach to pattern the heat-shrink polymer film, and thermally shrink the film as a shadow mask subsequently. Metal patterns with diffferent feature sizes were achieved from a single mold by shrink lithography through controlling the shrink contidions including temperature and force. A biosensor based on a suspended graphene nanoribbon is fabricated with the shrink lithography, demonstrating the potential application of this process to the fabrication of nanodevices and integrated circuits. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3697836]
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