Local Silicon-Gate Carbon Nanotube Field Effect Transistors Using Silicon-On-Insulator Technology

Zhang Min,philip c h chan,Chai Yang,Liang Qi,z k tang
DOI: https://doi.org/10.1063/1.2221515
IF: 4
2006-01-01
Applied Physics Letters
Abstract:A local silicon-gate carbon nanotube field effect transistor (CNFET) configuration has been proposed and implemented for integration purpose. By combining the advantages of in situ carbon nanotube growth technology and the silicon-on-insulator technology, we have realized the CNFETs with individual device operation, low parasitic capacitance, high yield fabrication, and better compatibility to the complementary-metal-oxide-semiconductor (CMOS) process. The CNFETs show up-to-date electrical performance. The scaling effect of gate oxide is also explored. This configuration makes CNFET a step closer to the CMOS integrated circuit application. (c) 2006 American Institute of Physics.
What problem does this paper attempt to address?