Nucleation of Gasb on Gaas (001) by Low Pressure Metal-Organic Chemical Vapor Deposition

Wang Lian-Kai,Liu Ren-Jun,Lu You,Yang Hao-Yu,Li Guo-Xing,Zhang Yuan-Tao,Zhang Bao-Lin
DOI: https://doi.org/10.1088/1674-1056/23/8/088110
2014-01-01
Chinese Physics B
Abstract:Orthogonal experiments of Ga Sb films growth on Ga As(001)substrates have been designed and performed by using a low-pressure metal–organic chemical vapor deposition(LP-MOCVD)system.The crystallinities and microstructures of the produced films were comparatively analyzed to achieve the optimum growth parameters.It was demonstrated that the optimized Ga Sb thin film has a narrow full width at half maximum(358 arc sec)of the(004)ω-rocking curve,and a smooth surface with a low root-mean-square roughness of about 6 nm,which is typical in the case of the heteroepitaxial single-crystal films.In addition,we studied the effects of layer thickness of Ga Sb thin film on the density of dislocations by Raman spectra.It is believed that our research can provide valuable information for the fabrication of high-crystalline Ga Sb films and can promote the integration probability of mid-infrared devices fabricated on mainstream performance electronic devices.
What problem does this paper attempt to address?